Scanned-Spot-Array EUV Imaging for High-Volume Maskless Lithography

Design data and optical simulation code for maskless EUV lithography system
Updated 9 Oct 2012

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This MATLAB program accompanies the following publication:
K. C. Johnson, "Scanned-spot-array extreme ultraviolet imaging for high-volume maskless lithography"
J. Vac. Sci. Technol. B 30, 051606 (2012) []

The program provides optical design data for the Schwarzschild EUV projection optics and for a Schupmann zone-plate microlens doublet, as described in the above publication; and it simulates the system ray-trace performance.

The encapsulated local functions provide a general-purpose ray tracing capability for lenses, mirrors, and diffraction gratings.

Cite As

Kenneth Johnson (2024). Scanned-Spot-Array EUV Imaging for High-Volume Maskless Lithography (, MATLAB Central File Exchange. Retrieved .

MATLAB Release Compatibility
Created with R2012a
Compatible with any release
Platform Compatibility
Windows macOS Linux
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Version Published Release Notes

Architectural code revisions; no algorithm changes.

Code comments revised.
Publication citation revised.

Description is updated with link to published paper.