Fourier ellipsometry simulation

This code demonstrates the working principle of a PCCA-configured Fourier ellipsometry, showing its sensitivity regarding film thicknesses.

Fourier ellipsometry (FE) has emerged as a promising tool for in-situ thin-film measurement in the semiconductor industry, addressing critical demands for compact, snapshot, and high-precision instrumentation in atomic-level manufacturing. Despite its potential, its adoption has been hindered by skepticism about its accuracy, often perceived as significantly lower than that of conventional spectroscopic ellipsometry. This code simulates how a PCCA-configured FE works and investigates its precision limits through Mueller matrix modeling.

Simply run Demo_simMMFE_Sensitivity to test the code.